Resistor, Capacitor and Inductor Production Equipment Automatic Exposure Machine

Product Details
Customization: Available
Automatic Grade: Automatic
Driven Type: Electric
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  • Resistor, Capacitor and Inductor Production Equipment Automatic Exposure Machine
  • Resistor, Capacitor and Inductor Production Equipment Automatic Exposure Machine
  • Resistor, Capacitor and Inductor Production Equipment Automatic Exposure Machine
  • Resistor, Capacitor and Inductor Production Equipment Automatic Exposure Machine
  • Resistor, Capacitor and Inductor Production Equipment Automatic Exposure Machine
  • Resistor, Capacitor and Inductor Production Equipment Automatic Exposure Machine
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  • Overview
  • Product Description
  • Product Parameters
  • Detailed Photos
Overview

Basic Info.

Model NO.
R-EP50
Speed
High Speed
Exposure Uniformity
>95%
Platform Gap Accuracy
±0.005mm (Repeated Positioning)
Explore Accuracy
Exposure Span ± 0.01mm
Control Method
PC&PLC
Transport Package
Vacuum Bag + Wooden Box
Specification
L2600xW1000xH1920 (mm)
Trademark
HOPO
Origin
China

Packaging & Delivery

Package Size
2600.00cm * 1000.00cm * 1920.00cm
Package Gross Weight
700.000kg

Product Description

Product Description

Automatic exposure machine transmits UVLED parallel light by turning on the light to transfer the image information on the film or other transparent body to the surface coated with photosensitive substances., It has become an indispensable main production equipment in semiconductor manufacturing, PCB industry and passive component industry.
 

Product Parameters
 Content
Spec. Specification Function Remark
Used production
type
60*70mm80 * 84 specification substrate (the dimension size of the substrate can be specified)    
Applicable film 4 inch film negative or film glass negative    
production
type
Dry and wet membranes can be shared    
MC Color HOPO Caesious    
Power 1P220V/16A/50Hz    
Pressure 5kg/cm²    
Operation Touch Screen Control    
Control Method PC&PLC    
Explore Strength When parallel half angle = 2 °, strength ≥ 50MW / cm ²    
Speed Mechanical positioning for 12 s / piece, CCD positioning for 20 s / piece (exposure time 2s is the standard)    
Explore Area Controllable uniformity within 100 * 100mm (customizable)    
positioning accuracy ± 0.01mm (edge positioning) optional CCD positioning, accuracy ± 0.005mm    
Explore Accuracy Exposure span ± 0.01mm    
Platform Gap Accuracy ±0.005mm (repeated positioning)    
Exposure uniformity >95%                    
Light Source Data 1.365 wavelength LED parallel light source
2.Energy 400mj / cm ² (or exposure ruler 9 steps), the exposure time shall not exceed 5S
3. The half angle can be freely adjusted between (1.5 ° / 2 ° / 3 °)
   
Parts Parallel half meter / optical microscope    
Dimension L2600xW1000xH1920 (mm)    
Weight About 700kg    
 
Detailed Photos

Resistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure MachineResistor, Capacitor and Inductor Production Equipment Automatic Exposure Machine

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