Thick Film Resistor Process Auxiliary Equipment Substrate Cleaning Machine

• After-sales Service: 24h*7
• Warranty: One Year
• Cleaning Process: Hot Water Cleaning
• Style: Integrated Style
• Clean Type: High Pressure Cleaning
• Usage: Substrate
• Model NO.: R-SW01
• Principle: Physical Cleaning
• Fuel: Electric
• Certification: CE
• Control: Artificial
• Automation: Automatic
• Condition: New
• Remote Control: Without Remote Control
• Customized: Customized
• Control Method: PLC+HMI
• Equipment C/T: 10~30s/Chip
• Applicable Product Type: 0402, 0603, 0805, 1206, 1
• Crop Rate: 85%
• Transport Package: Standard
• Specification: Length 3200x Width 650xHeight 1400 (mm)
• Trademark: HOPO
• Origin: China
• Production Capacity: 4000pieces/Year

Product Description

Applicable product types: 04020603080512061210, 20102512

Equipment C/T: 10-30S/piece

Yield:/

Control: PLC+HMI

Appearance dimensions: length 3200x width 650xheight 1400 (mm) (subject to entity)

Efficient equipment operation, with a crop utilization rate of up to 85%

Stable product quality and high industry recognition

Independently designed with invention patents and practical patents

Detailed Photos