• Film Resistor Process Exposure Equipment
  • Film Resistor Process Exposure Equipment
  • Film Resistor Process Exposure Equipment
  • Film Resistor Process Exposure Equipment
  • Film Resistor Process Exposure Equipment
  • Film Resistor Process Exposure Equipment

Film Resistor Process Exposure Equipment

Automatic Grade: Automatic
Driven Type: Pneumatic
Precision: High Precision
Customization:
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Film Resistor Process Exposure Equipment pictures & photos
Film Resistor Process Exposure Equipment
US $50,000 / Piece
Min. Order: 1 Piece
Manufacturer/Factory & Trading Company
Gold Member Since 2023

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Anhui, China
Importers and Exporters
The supplier has import and export rights
Patents Awarded
The supplier had awarded 1 patents, you can check the Audit Report for more information
Customization from Designs
The supplier provides design based customization services
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  • Overview
  • Product Description
  • Product Parameters
  • Company Profile
  • Detailed Photos
Overview

Basic Info.

Model NO.
R-EP50
Speed
High Speed
Applicable Sizes
50*60mm, 60*70mm, 80*84mm
Applicable Film
4-Inch Film Negative or Customized
Exposure Area
100 *100mm
Exposure Uniformity
More Than 95%
Control Method
Controlled by PC&PLC
Transport Package
Vacuum Bag + Wooden Box
Specification
L2600xW1000xH1920 (mm)
Trademark
HOPO
Origin
China

Packaging & Delivery

Package Size
260.00cm * 100.00cm * 192.00cm
Package Gross Weight
460.000kg

Product Description

Product Description

Use advanced CCD visual positioning technology to improve production speed and accuracy
The exposure film is fully adjustable, and camera-assisted observation is used to improve humanization and convenience

The equipment contains multiple patent applications
Following the pace of big data development, the equipment has a network data upload function, making production management and quality control faster
The software design has manual debugging mode and automatic mode, allowing equipment debugging and Formula parameter editing is more convenient
Multi-storage silo automatic switching design increases the continuous utilization rate of equipment and production

 

Product Parameters

Technical Parameters

Function

 

Automatic feeding, full spectrum exposure, automatic film. Dry film and wet film can be shared..

Applicable specifications

60 * 70mm, 80 * 84mm specification substrate (can be specified)

Speed

Mechanical positioning 12 seconds per film, CCD positioning 20 seconds per film (exposure time 2S as standard)

Intensity of exposure

>30mw/cm2

Accuracy of exposure

±0.008mm

Precision of platform parallelism

The four corners of the plate adsorption platform and the film platform must be relatively parallel, and the parallel error is less than ±0.005mm

Company Profile

  HOPO Technology was founded in 2005. It focuses on the research and development and production of active and passive component equipment, semiconductor equipment, as well as the production of high-precision parts and consumables. Its product technology is well received by customers at home and abroad. HOPO currently has 3 R&D design centers and visual teams, located in Kunshan, Shanghai and Wuxi; in addition, there are Dongguan Branch, Shanghai Branch, Anhui Branch, Malaysia Branch, Taiwan Branch, Suzhou Jinde Electronics, and Suzhou and Laimei PRECISION MACHINERY LIMITED.
  The company is eager to combine practice and theory, transform technology into productivity, provide customers with automated and intelligent solutions, and bring social value.

Detailed Photos

Film Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure EquipmentFilm Resistor Process Exposure Equipment

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