| Customization: | Available |
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| Automatic Grade: | Automatic |
| Driven Type: | Electric |
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Vacuum pumping system: mechanical pump + molecular pump
Sputtering method: DC pulse magnetic Controlled sputtering, power6KW
Capacity:50min/furnace
Good Rate: more than 99%
Working gas delivery: mass flow meter (MFC) + solenoid valve combination, input Ar (0~100sccm±1%)
The equipment operates efficiently and the utilization rate is as high as 85%
The product quality is stable and highly recognized in the industry
Independent design and invention patent and utility patents
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Technical Data |
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Function |
This equipment can be used for mass production of chip resistor electrode production, multi-functional design, can meet the diverse needs of different processes, high automation, fast pumping rate, can meet the demand for the production of resistor electrode. |
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Sputter Type |
DC Pulse Magnetron sputtering, German ADLMain pulse power 6KW*8 |
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Speed/limit vacuum |
6.0×10-3 Pa<20minutes;5.0×10-5Pa( No load) |
HOPO Technology was founded in 2005. It focuses on the research and development and production of active and passive component equipment, semiconductor equipment, as well as the production of high-precision parts and consumables. Its product technology is well received by customers at home and abroad. HOPO currently has 3 R&D design centers and visual teams, located in Kunshan, Shanghai and Wuxi; in addition, there are Dongguan Branch, Shanghai Branch, Anhui Branch, Malaysia Branch, Taiwan Branch, Suzhou Jinde Electronics, and Suzhou and Laimei PRECISION MACHINERY LIMITED.
The company is eager to combine practice and theory, transform technology into productivity, provide customers with automated and intelligent solutions, and bring social value.
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